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Investigation of structural and electrical properties of Zirconium dioxide thin films deposited by reactive RF sputtering technique

Coşkun, Burhan; Asar, Tarık; Akgül, Ünal; Yıldız, Köksal; Atıcı, Yusuf (Taylor & Francis Ltd, 2016)

ZrO2 thin films with different thicknesses (400nm, 500nm, 600nm) were deposited by reactive RF magnetron sputtering technique, on n-type Silicon (100) substrate at 200 degrees C applying 125W power ratin`g. The micro ...